Chemically amplified resist composition
US7575850B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 28, 2008 |
| Grant date | Aug 18, 2009 |
| Priority date | — |
| Expiry date | Jan 28, 2028 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/123
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides a chemically amplified resist composition comprising: wherein R1 represents a hydrogen atom or a methyl group, ring X represents a C3-C30 cyclic hydrocarbon group in which one —CH2— is substituted with —COO—, and at least one hydrogen atom in the C3-C30 cyclic hydrocarbon group may be substituted, and p represents an integer of 1 to 4, and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, and wherein Y1 and Y2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, A+ represents an organic counter ion and R21 represents a C1-C30 hydrocarbon group which may be substituted and at least one —CH2— in the C1-C30 hydrocarbon group may be substituted with —CO— or —O—, and a salt represented by the formula (III):A′+−O3S—R23 (III)wherein R23 represents a C1-C8 linear or branched chain perfluoroalkyl group and A′+ represents an organic counter ion.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.