Etchant composition, methods of patterning conductive layer and manufacturing flat panel display device using the same
US7582217B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 15, 2006 |
| Grant date | Sep 1, 2009 |
| Priority date | — |
| Expiry date | Mar 31, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/32134
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An etchant composition, and methods of patterning a conductive layer and manufacturing a flat panel display device using the same are provided. The etchant composition may include phosphoric acid, nitric acid, acetic acid, water and an additive, wherein the additive includes a chlorine-based compound, a nitrate-based compound, and an oxidation regulator. In addition, the flat panel display device may be manufactured by patterning a gate electrode, source/drain electrodes and a pixel electrode using the same etchant composition. The gate electrode, source/drain electrodes and the pixel electrode may be formed of different conductive materials. Accordingly, processes are simplified so that manufacturing costs may be reduced and productivity may be improved.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.