Patent · US Active

Coating compositions

US7582585B2 · kind B2 · utility

1Cited by

11References

26Claims

0Family size

Assignees

Rohm and Haas Electronic Materials LLC · US
E.I. DU PONT DE NEMOURS AND COMPANY · US

Inventors

Peter Trefonas, III · Medway, US
Sungseo Cho · Milford, US
David L. Goff · Hockessin, US
J. Ioan Matthews · Hockessin, US
Hao Yun · Changzhou City, CN

Key dates

Filing date	Dec 30, 2004
Grant date	Sep 1, 2009
Priority date	—
Expiry date	Nov 22, 2026

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/091
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Coating compositions are provided that include a component that is a product of materials comprising an amine and an anhydride and/or an anhydride derivative. Compositions of the invention are particularly useful as an underlying antireflective coating composition (“ARC”) employed with an overcoated photoresist layer in the manufacture of microelectronic wafers and other electronic devices.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.