Materials and optical devices based on group IV quantum wells grown on Si-Ge-Sn buffered silicon
US7582891B2 · kind B2 · utility
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6References
5Claims
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Key dates
| Filing date | Sep 16, 2005 |
| Grant date | Sep 1, 2009 |
| Priority date | — |
| Expiry date | Sep 16, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02E10/547
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Semiconductor structures having at least one quantum well heterostructure grown strain-free on Si(100) via a Sn1-xGex buffer layer and their uses are provided.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.