Circuit structure with a double-gate organic thin film transistor device and application thereof
US7582898B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 20, 2006 |
| Grant date | Sep 1, 2009 |
| Priority date | — |
| Expiry date | Jul 20, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10K10/482
Abstract
This invention provides a circuit structure with a double-gate organic thin film transistor device and application thereof. A protection layer covered on an organic thin film transistor structure having a bottom gate is used as another gate insulating layer. A metal layer is formed on this gate insulating layer to serve as another gate. A double-gate structure is hence accomplished. The double-gate structure can be used in a circuit. By the double-gate structure the threshold voltage of the organic thin film transistor can be adjusted, and advantageously changing the characteristic of the organic thin film transistor to improve the accuracy of signal transmission.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.