Patent · US Active

High-density probe array

US7583095B2 · kind B2 · utility

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1References
16Claims
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Key dates

Filing dateAug 15, 2006
Grant dateSep 1, 2009
Priority date
Expiry dateJul 10, 2027

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T29/49151
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A probe array may be fabricated by forming probes arranged on a sacrificial substrate, forming a probe substrate above the probes, and removing the sacrificial substrate. In one embodiment, first probes may be two-dimensionally formed in row and column directions on a sacrificial substrate. Second probes may be formed between the first probes arranged in the row direction such that a distance between the first and second probes is smaller than the resolution limit in a lithography process. A probe substrate may be formed on the sacrificial substrate having the first and second probes, and the sacrificial substrate may be removed.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.