Exposure apparatus and device manufacturing method
US7583356B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | May 15, 2008 |
| Grant date | Sep 1, 2009 |
| Priority date | — |
| Expiry date | May 15, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F9/7026
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An exposure apparatus includes a stage configured to hold a substrate; a projection optical system configured to project light from an original onto the substrate; a measurement device configured to measure a position of a surface of the substrate in an optical axis direction of the projection optical system; and a controller configured to i) cause the measurement device to measure positions of the surface with respect to a plurality of points on the surface over a plurality of shot areas, ii) obtain a shape of the surface based on the positions of the surface measured with respect to the plurality of points, and iii) cause the stage to be moved based on the obtained shape between an exposure of a first shot area and an exposure of a second shot area, and the measurement device to measure a position of a surface in the second shot area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.