Optoelectronic process and a device for inspection of an area of revolution of a receptacle
US7583377B2 · kind B2 · utility
0Cited by
8References
11Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Oct 13, 2004 |
| Grant date | Sep 1, 2009 |
| Priority date | — |
| Expiry date | Dec 13, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N21/9054
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An optoelectronic process for inspection of an area of revolution of a receptacle presenting an axis of revolution, includes: The illumination is over at least three angular sectors, each emitting a given radiation spectrum that is separate from all the spectra of the other sectors. Only the light rays returned by the surface to be inspected are selected and one of the said given radiation spectra are presented to eliminate the parasitic light rays whose radiation spectrum does not correspond to that selected for the said angular sector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.