Apparatus and method for correction of aberrations in laser system optics
US7584756B2 · kind B2 · utility
30Cited by
21References
36Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Aug 17, 2004 |
| Grant date | Sep 8, 2009 |
| Priority date | — |
| Expiry date | Jun 4, 2025 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61F2009/00872
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
The present invention provides a method for minimizing fluence distribution of a laser over a predetermined pattern. In particular, the method is useful for minimizing fluence variance over a predetermined pattern for lasers used in ophthalmic surgery.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.