Polishing composition containing polyether amine
US7585340B2 · kind B2 · utility
13Cited by
22References
7Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Apr 27, 2006 |
| Grant date | Sep 8, 2009 |
| Priority date | — |
| Expiry date | Apr 27, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/3212
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
The inventive chemical-mechanical polishing system comprises a polishing component, a liquid carrier, and a polyether amine. The inventive method comprises chemically-mechanically polishing a substrate with the aforementioned polishing system.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.