Hydrogen sulfide injection method for phosphor deposition
US7585545B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 28, 2004 |
| Grant date | Sep 8, 2009 |
| Priority date | — |
| Expiry date | Mar 10, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05B33/14
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The invention is a method of vacuum evaporation of a multi-element sulfur bearing thin film compositions onto a substrate. The method comprises targeting a source of gas or vapour sulfur species at one or more source materials that make up at least part of the thin film composition during evaporation of the source materials. The sulfur species is heated to a high temperature as it reaches the one or more source materials and there is a chemical interaction of the sulfur species with evaporant from the one or more source materials during deposition of said thin film composition. The method is particularly useful for the deposition of phosphors for full colour ac electroluminescent displays employing thick film dielectric layers with a high dielectric constant.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.