Patent · US Expired

Method for manufacturing patterned porous molded product or nonwoven fabric, and electric circuit component

US7586047B2 · kind B2 · utility

6Cited by
6References
12Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 13, 2005
Grant dateSep 8, 2009
Priority date
Expiry dateAug 3, 2025

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T442/674
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

An object of the present invention is to provide a method for manufacturing a porous material in which complicated and fine through portions, recessed portions, and the like have been patterned. It is to provide a patterned porous molded product or nonwoven fabric, in which a plated layer has been selectively formed on the surfaces of the through portions and the recessed portions.With the invention, a mask having through portions in a pattern is placed on at least one side of the porous molded product or the nonwoven fabric. A fluid or a fluid containing abrasive grains is sprayed from above the mask, thereby to form through portions or recessed portions, or both of them, to which the opening shape of each through portion of the mask has been transferred, in the porous molded product or the nonwoven fabric. The invention provides a porous molded product or a nonwoven fabric in which a plated layer has been selectively formed on the surfaces of the through portions or the recessed portions, or both of these, an electric circuit component, or the like.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.