Patent · US Active

Production of high-purity, large-volume monocrystals that are especially radiation-resistant from crystal shards

US7588637B2 · kind B2 · utility

4Cited by

4References

8Claims

0Family size

Assignee

Schott AG · DE

Inventors

Andreas Weisleder · Eisenberg, DE
Matthias Mueller · Harsefeld, DE
Joerg Kandler · Cospeda, DE
Andreas Menzel · Jena, DE
Rainer Guett · Bad Klosterlausnitz, DE

Key dates

Filing date	Dec 12, 2006
Grant date	Sep 15, 2009
Priority date	—
Expiry date	Apr 20, 2027

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC30B29/12
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A method for producing high-purity, large-volume monocrystals that are especially radiation-resistant and have low intrinsic birefringence. From a melt of crystalline raw material, with controlled cooling and solidification, a crystal is generated. As the crystalline raw material, shards and/or waste from already-grown crystals is used, and the re-used raw material In this way, crystals can be obtained which after tempering have a BSDF value of <7×10−7, an RMS homogeneity after the subtraction of 36 Zernike coefficients of <15×10−8, an SDR-RMS value in the 111 direction of <0.2 nm/cm.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.