Single-process-chamber deposition system
US7588669B2 · kind B2 · utility
4Cited by
23References
20Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Jul 20, 2005 |
| Grant date | Sep 15, 2009 |
| Priority date | — |
| Expiry date | Aug 21, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3473
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A deposition system includes a process chamber, a workpiece holder for holding the workpiece within the process chamber, a first target comprising a first material, a second target comprising a second material, a single magnet assembly disposed that can scan across the first target and the second target to deposit the first material and the second material on the workpiece, and a transport mechanism that can cause relative movement between the magnet assembly and the first target or the second target.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.