Plasma generating electrode and plasma reactor
US7589296B2 · kind B2 · utility
Assignees
Inventors
Key dates
| Filing date | Sep 10, 2004 |
| Grant date | Sep 15, 2009 |
| Priority date | — |
| Expiry date | Nov 3, 2024 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05H1/2437
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A plasma generating electrode according to the invention includes at least two opposing plate-shaped unit electrodes 2, each having a rectangular surface and four end faces, and a holding member 5 which holds at least one (fixed end 6) of a pair of parallel ends (pair of ends) of four ends of the unit electrode 2 corresponding to the four end faces, at least one of the opposing unit electrodes 2 being a conductive-film-containing electrode 8 including a ceramic body 3 and a conductive film 4, and a distance “a” (mm) from an edge of the conductive film 4 to an edge of the ceramic body 3 on the other pair of parallel ends (other pair of ends 9) of the four ends of the conductive-film-containing electrode 8 adjacent to the pair of ends and a thickness “c” (mm) of the ceramic body 3 satisfying a relationship “(c/2)≦a≦5c”. The plasma generating electrode 1 is effectively prevented from breaking due to thermal shock.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.