MOPA laser apparatus with two master oscillators for generating ultraviolet radiation
US7593440B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Mar 23, 2006 |
| Grant date | Sep 22, 2009 |
| Priority date | — |
| Expiry date | Nov 29, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/2308
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Laser apparatus including two different, pulsed MOPAs, one having a fundamental wavelength of 1064 nm and the other having a fundamental wavelength of 1564 nm, provide trains of optical pulses. The 1064-nm pulses are frequency tripled to 355 nm and the 1564-nm pulses are frequency doubled to 782 nm. The 355-nm and 782-nm pulses are mixed to provide 244-nm pulses. The 244-nm pulses are mixed with residual 1064-nm pulses to provide 198-nm output pulses of the apparatus. The output pulses can be either digitally modulated or amplitude modulated by controlling the phase relationship between the 1064-nm and 1564-nm pulses.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.