Method for generating pseudo-random pattern designs for optical position determination systems
US7593829B2 · kind B2 · utility
2Cited by
2References
20Claims
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Key dates
| Filing date | May 16, 2007 |
| Grant date | Sep 22, 2009 |
| Priority date | — |
| Expiry date | May 16, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01C15/00
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method for generating a pseudo-random pattern of dots to be patterned on a surface including the steps of receiving surface input parameters for the surface, selecting dot locations for the pseudo-random pattern of dots for at least a portion of the surface based on the surface input parameters, and outputting coordinates for dot centers based on the dot locations.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.