Patent · US Active

Method for evaluating reliance level of a virtual metrology system in product manufacturing

US7593912B2 · kind B2 · utility

15Cited by
13References
15Claims
0Family size

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Key dates

Filing dateDec 29, 2006
Grant dateSep 22, 2009
Priority date
Expiry dateDec 3, 2027

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG05B23/024
  • WIPO fieldControl
  • WIPO sectorInstruments

Abstract

A method for evaluating reliance level of a virtual metrology system is disclosed. In this method, a reliance index (RI) and a RI threshold value are calculated by analyzing the process data of production equipment, thereby determining if the virtual metrology result is reliable. Besides, in this method, a global similarity index (GSI) and individual similarity indexes (ISI) are also provided for defining the degree of similarity between the current set of process data and all of the sets of historical process data used for establishing the conjecture model, thereby assisting the RI in gauging the degree of reliance and locating the key parameter(s) that cause major deviation.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.