Surgical implant
US7594921B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Apr 2, 2002 |
| Grant date | Sep 29, 2009 |
| Priority date | — |
| Expiry date | Mar 15, 2023 |
Classification
- Technology area (CPC A)Human Necessities
- CPC primaryA61F2250/0071
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
A surgical implant suitable for treatment of hernias includes a mesh having a residual maximum mass density of 5O g/m<2>. The mesh has strands forming spaces and the strands define filaments forming pores. The spaces and pores are sized to minimize foreign body mass for implantation and to encourage integration of the implant. The mesh may be delivered using Dual Phase Technology for ease of handling, cutting and placement. The Dual Phase Technology may include encapsulation or coating with hydrogel.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.