Method of manufacturing vacuum plasma treated workpieces
US7595096B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 23, 2004 |
| Grant date | Sep 29, 2009 |
| Priority date | — |
| Expiry date | Aug 16, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/32165
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A method of manufacturing vacuum plasma treated workpieces includes the steps of introducing at least one workpiece to be treated into a vacuum chamber; treating the workpiece in the vacuum chamber, thereby establishing a plasma discharge in the vacuum chamber by a supply signal with maximum energy at a first frequency which is at least in the Hf frequency range; removing the workpiece treated from the vacuum chamber; performing a cleaning inside the vacuum chamber, thereby establishing the plasma discharge by a supply signal with maximum energy at a second frequency higher than the Hf frequency; and repeating these steps at least one time.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.