Patent · US Active

Method for fabricating micrometer or nanometer channels

US7598109B2 · kind B2 · utility

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10Claims

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Assignee

Max-Planck-Gesellschaft zur Föderung der Wissenschaften e.V. · US

Inventors

Oliver Schmidt · Palo Alto, US
Yongfeng Mei · Stuttgart, DE
Dominic Thurmer · Dresden, DE
Francesca Cavallo · Albuquerque, US

Key dates

Filing date	Jan 29, 2007
Grant date	Oct 6, 2009
Priority date	—
Expiry date	Jan 2, 2028

Classification

Technology area (CPC B)Performing Operations; Transporting
CPC primaryB81C1/00071
WIPO fieldMicro-structural and nano-technology
WIPO sectorChemistry

Abstract

Thin films, which are deposited on a sacrificial film on a substrate, are released and bonded back on a substrate surface. This technology provides open and closed 2D confined micro-/nano-channels and channel networks on a substrate surface. The geometry, size and complexity of the channels and channel networks can be modified by the film and substrate properties as well as the treatment techniques of the sacrificial layer etching. A method to fabricate such structures with position- and pattern-controllability is provided.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.