Adjustable lithography blocking device and method
US7598507B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jun 11, 2003 |
| Grant date | Oct 6, 2009 |
| Priority date | — |
| Expiry date | May 31, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/7035
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
The present invention provides, in one embodiment, a method (100) of manufacturing a semiconductor device. A conventionally formed reticle is positioned over a resist located on a substrate (110). A radiation path through the reticle and a window assembly located between a radiation source and resist (120), is considered. It is determined whether or not the radiation would expose a predefined blocking area of the resist within the exposure zone (130). If the radiation would expose a blocking area, then the window assembly is configured to prevent radiation from exposing the blocking area in the exposure zone (140). Other embodiments include a window assembly (300) and system (400) to facilitate manufacturing of the semiconductor device according to the method (100).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.