Patent · US Active

Method for marking defect and device therefor

US7599052B2 · kind B2 · utility

1Cited by
17References
10Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 13, 2008
Grant dateOct 6, 2009
Priority date
Expiry dateAug 13, 2028

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG01N21/89
  • WIPO fieldMeasurement
  • WIPO sectorInstruments

Abstract

A defect marking device includes a flaw inspection device which has a plurality of light-receiving parts that identify reflected lights coming from an inspection plane of a metal strip under two or more of optical conditions different from each other; a signal processing section that judges the presence/absence of surface flaw on the inspection plane based on a combination of reflected light components identified under these optical conditions different from each other; and a marking device which applies marking that indicates information relating to the flaw on the surface of the metal strip.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.