Positioning apparatus and exposure apparatus
US7602091B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Feb 18, 2005 |
| Grant date | Oct 13, 2009 |
| Priority date | — |
| Expiry date | Jun 4, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70758
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A positioning apparatus includes a beam which is driven in a first direction that is perpendicular to the longitudinal direction of the beam, a movable member which surrounds at least a part of the beam and moves with the beam moving in the first direction, an actuator which generates a force in the first direction between the beam and the movable member to control a positional relationship in the first direction between the beam and the movable member, and a position regulator arranged between the beam and the movable member and which regulates the positional relationship in the first direction between the beam and the movable member.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.