Method of making a solar grade silicon wafer
US7604696B2 · kind B2 · utility
7Cited by
2References
8Claims
0Family size
Inventor
Key dates
| Filing date | Mar 21, 2007 |
| Grant date | Oct 20, 2009 |
| Priority date | — |
| Expiry date | Jun 27, 2027 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B11/002
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of making a solar grade silicon wafer is disclosed. In at least some embodiments of this invention, the method includes the follow steps: providing a slurry including a liquid that essentially prevents the oxidation of silicon powder and a silicon powder that is essentially free of oxides; providing a solar grade wafer mold defining an interior for receiving the slurry; introducing the slurry into the solar grade wafer mold; precipitating the silicon powder from the slurry to form a preform of the solar grade silicon wafer; and crystallizing the preform to make the solar grade silicon wafer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.