Electrochemical device
US7604717B2 · kind B2 · utility
61Cited by
12References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jul 28, 2004 |
| Grant date | Oct 20, 2009 |
| Priority date | — |
| Expiry date | Dec 25, 2024 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG02F1/1524
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
The invention relates to an essentially metallic target of a cathodic sputtering device, in particular a magnetic-field-assisted device, the said target mainly comprising nickel alloyed with at least one other minor element in order to reduce or eliminate its ferromagnetism. The invention also relates to the use of the target to manufacture an electrochromic material with anodic colourization as a thin layer based on alloyed nickel oxide.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.