Antireflection film
US7604866B2 · kind B2 · utility
22Cited by
5References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 10, 2004 |
| Grant date | Oct 20, 2009 |
| Priority date | — |
| Expiry date | May 26, 2025 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31786
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
An antireflection film comprising silica particles and at least one binder compound, which has a silica particle content of 30% by weight or more, an arithmetic mean surface roughness (Ra) of not more than 2 nm, and a surface silicon atom content of 10 atom % or more.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.