Oxide sintered body and an oxide film obtained by using it, and a transparent base material containing it
US7611646B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Nov 27, 2006 |
| Grant date | Nov 3, 2009 |
| Priority date | — |
| Expiry date | Jun 9, 2027 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/31938
- WIPO fieldMaterials, metallurgy
- WIPO sectorChemistry
Abstract
The oxide sintered body mainly consists of gallium, indium, and oxygen, and a content of the gallium is more than 65 at. % and less than 100 at. % with respect to all metallic elements, and the density of the sintered body is 5.0 g/cm3 or more. The oxide film is obtained using the oxide sintered body as a sputtering target, and the shortest wavelength of the light where the light transmittance of the film itself except the substrate becomes 50% is 320 nm or less. The transparent base material is obtained by forming the oxide film on one surface or both surfaces of a glass plate, a quartz plate, a resin plate or resin film where one surface or both surfaces are covered by a gas barrier film, or on one surface or both surfaces of a transparent plate selected from a resin plate or a resin film where the gas barrier film is inserted in the inside.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.