Lithographic printing plate precursors with oligomeric or polymeric sensitizers

US7615323B2 · kind B2 · utility

Assignee

• Kodak Graphic Communications GmbH · DE

Inventors

• Bernd Strehmel · Berlin, DE
• Harald Baumann · Tuttlingen, DE
• Udo Dwars · Herzberg, DE
• Detlef Pietsch · Badenhausen, DE
• Axel Draber · Osterode, DE
• Michael Mursal · Hörden, DE

Key dates

• Filing date: Nov 11, 2005
• Grant date: Nov 10, 2009
• Expiry date: Jul 26, 2026

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10S522/913
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

Lithographic printing plate precursor comprising (a) a lithographic substrate with a hydrophilic surface and (b) a radiation-sensitive coating on the hydrophilic surface comprising (i) one or more types of monomers and/or oligomers and/or polymers, each comprising at least one ethylenically unsaturated group accessible to a free radical polymerization, (ii) at least one sensitizer, and at least one coinitiator capable of forming free radicals together with the sensitizer (ii); characterized in that the at least one sensitizer is an oligomeric or polymeric compound comprising the following structural unit (Formula (I)), wherein π1 is an aromatic or heteroaromatic unit or a combination of the two so that a conjugated n-system is present between the two groups Z in structure (I), each Z independently represents a heteroatom, each R1 and R2 is independently selected from a halogen atom, an alkyl, aryl, alkylaryl or aralkyl group, a group —NR3R4 and a group —OR5, each R3, R4 and R5 is independently selected from an alkyl, aryl, alkylaryl and aralkyl group, a and b independently represent 0 or an integer from 1 to 4, n has a value of >1 and AS is an aliphatic spacer.