Semiconductor device, manufacturing process thereof and imaging device
US7619269B2 · kind B2 · utility
25Cited by
5References
18Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 31, 2005 |
| Grant date | Nov 17, 2009 |
| Priority date | — |
| Expiry date | Mar 31, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10F39/026
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
A semiconductor device including a pixel region in which one or more pixels are formed and a DRAM cell region in which one or more DRAM cells for storing output signals from the pixels are formed, characterized in that the layers constituting the pixel region and the DRAM cell region are formed in the same semiconductor process.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.