Reactive metal sources and deposition method for thioaluminate phosphors
US7622149B2 · kind B2 · utility
1Cited by
7References
45Claims
0Family size
Assignee
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Key dates
| Filing date | Mar 4, 2005 |
| Grant date | Nov 24, 2009 |
| Priority date | — |
| Expiry date | Dec 13, 2026 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05B33/145
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A physical vapor deposition method for the deposition of thioaluminate phosphor compositions includes providing one or more source materials including an intermetallic barium aluminum compound, a barium aluminum alloy or a protected barium metal, providing an activator species and effecting deposition of the one or more source materials and activator species as a phosphor composition on a selected substrate. The method allows for the deposition of blue thin film electroluminescent phosphors with high luminance and colors required for TV applications.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.