Reflective X-ray microscope and inspection system for examining objects with wavelengths <100 nm

US7623620B2 · kind B2 · utility

Assignee

• Carl Zeiss SMT GmbH · DE

Inventors

• Hans-Jurgen Mann · Oberkochen, DE
• Udo Dinger · Oberkochen, DE
• Wilhelm Ulrich · Aalen, DE
• Wolfgang Reinecke · Zeuthen, DE
• Thomas Engel · Aalen, DE
• Axel Zibold · Jena, DE
• Wolfgang Harnisch · Lehesten, DE
• Marco Wedowski · Aalen, DE
• Dieter Pauschinger · Berlin, DE

Key dates

• Filing date: Nov 8, 2004
• Grant date: Nov 24, 2009
• Expiry date: Jun 21, 2026

Classification

• Technology area (CPC G): Physics
• CPC primary: G21K1/062
• WIPO field: Engines, pumps, turbines
• WIPO sector: Mechanical engineering

Abstract

There is provided a reflective X-ray microscope for examining an object in an object plane. The reflective X-ray microscope includes (a) a first subsystem, having a first mirror and a second mirror, disposed in a beam path from the object plane to the image plane, and (b) a second subsystem, having a third mirror, situated downstream of the first subsystem in the beam path. The object is illuminated with radiation having a wavelength <100 nm, and the reflective X-ray microscope projects the object with magnification into an image plane.