Method of fabricating one-way transparent optical system
US7625693B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 7, 2005 |
| Grant date | Dec 1, 2009 |
| Priority date | — |
| Expiry date | Jul 19, 2027 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03C1/00
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of fabricating a one-way transparent optical system by which external light is effectively intercepted and internal light passes nearly without loss is provided. The method includes: forming a silver halide on a transparent substrate; aligning a mask in which a predetermined pattern is formed, on the transparent substrate and exposing the silver halide using the mask; developing and fixing the exposed silver halide and forming a plurality of light-absorbing materials on the transparent substrate; and forming protrusion structures having a shape of a convex lens shape for refracting incident light toward a corresponding light-absorbing material of the light-absorbing materials, on the transparent substrate on which the light-absorbing materials are formed.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.