Light source device for producing extreme ultraviolet radiation and method of generating extreme ultraviolet radiation
US7626188B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jul 30, 2007 |
| Grant date | Dec 1, 2009 |
| Priority date | — |
| Expiry date | Jul 23, 2028 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0088
- WIPO fieldMedical technology
- WIPO sectorInstruments
Abstract
Electrode ablation is controlled in EUV light source device that gasifies a raw material by irradiation with an energy beam and produces a high-temperature plasma using electrodes a raw material for plasma is dripped in a space in the vicinity of, but other than, the discharge region and from which the gasified raw material can reach the discharge region between the discharge electrodes and a laser beam irradiates the high-temperature plasma raw material. A gasified high-temperature plasma raw material, gasified by the laser beam, spreads in the direction of the discharge region. At this time, power is applied on a pair of discharge electrodes, the gasified high-temperature plasma raw material is heated and excited to become a high-temperature plasma, and EUV radiation is emitted. This EUV radiation is collected by an EUV collector mirror and sent to lithography equipment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.