Diffractive thin-film piezoelectric micromirror and method of producing the same
US7626745B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Sep 28, 2004 |
| Grant date | Dec 1, 2009 |
| Priority date | — |
| Expiry date | Jul 12, 2025 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG09F9/372
- WIPO fieldAudio-visual technology
- WIPO sectorElectrical engineering
Abstract
Disclosed is a diffractive micromirror and a method of producing the same. More particularly, the present invention pertains to a diffractive thin-film piezoelectric micromirror, which is operated in a piezoelectric operation manner to assure excellent displacement, operation speed, reliability, linearity, and low voltage operation, and a method of producing the same. The diffractive thin-film piezoelectric micromirror includes a silicon substrate on which a recess is formed to provide an air space to the center thereof, and a piezoelectric mirror layer having a band shape, which is attached to the silicon substrate along both ends of the recess at both ends thereof while being spaced from the bottom of the recess at a center portion thereof and which includes a thin-film piezoelectric material layer to be vertically movable when voltage is applied to the piezoelectric material layer, and thus diffracts an incident light beam.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.