Patent · US Expired

Systems and methods for improved biometric feature definition

US7627151B2 · kind B2 · utility

45Cited by
238References
30Claims
0Family size

Assignee

Inventor

Key dates

Filing dateNov 23, 2005
Grant dateDec 1, 2009
Priority date
Expiry dateNov 23, 2025

Classification

  • Technology area (CPC G)Physics
  • CPC primaryG06V40/40
  • WIPO fieldComputer technology
  • WIPO sectorElectrical engineering

Abstract

Methods and systems are provided for performing a biometric function. A purported skin site of an individual is illuminated under distinct optical conditions during a single illumination session for a fixed position of the purported skin site. Light from the purported skin site is received for each of the optical conditions. Images of the purported skin site are generated from the received light. The images are analyzed to identify a biometric feature as a characteristic in a portion of at least one of the images. The biometric function is implemented in accordance with an identification of the biometric feature.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.