Method of producing 3-D mold, method of producing finely processed product, method of producing fine-pattern molded product, 3-D mold, finely processed product, fine-pattern molded product and optical component
US7629596B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Feb 21, 2006 |
| Grant date | Dec 8, 2009 |
| Priority date | — |
| Expiry date | Oct 5, 2026 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB29K2083/00
- WIPO fieldMicro-structural and nano-technology
- WIPO sectorChemistry
Abstract
To provide production methods for a 3-D mold, a finely processed product, and a fine pattern molded product in which the depth and the line width can be formed with high precision, a 3-D mold, a finely processed product, a fine-pattern molded product, and an optical element formed with high precision.A method of producing a 3-D mold that is configured to control depth within 10 nm and form a line width of 200 nm or less, wherein an irradiation step, which irradiates an electron beam to a resist layer of an object of processing that has the resist layer constituted with a polysiloxane-based material on or above a substrate, includes a step having irradiation conditions such that the acceleration voltage is from 1 kV to 3 kV without generation of the backscattering and the dosage is 400 μC/cm2, a method of producing finely processed product using the 3-D mold, a method of producing fine-pattern molded product using the 3-D mold or the finely processed product, and the 3-D mold, the finely processed product, the fine-pattern molded product, and an optical element formed with high precision with these production methods.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.