Optical proximity correction performed with respect to limited area
US7631288B2 · kind B2 · utility
2Cited by
6References
8Claims
0Family size
Assignee
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Key dates
| Filing date | Feb 21, 2006 |
| Grant date | Dec 8, 2009 |
| Priority date | — |
| Expiry date | Nov 15, 2026 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F1/36
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of performing optical proximity effect correction includes defining a partial area of an entire area of a mask pattern, the mask pattern including a real pattern and a dummy pattern, and performing optical proximity effect correction only with respect to the partial area.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.