Cyclic loading system and methods for forming nanostructures

US7632088B2 · kind B2 · utility

Assignee

• THE PROVOST, FELLOWS AND SCHOLARS OF THE COLLEGE OF THE HOLY AND UNDIVIDED TRINITY OF QUEEN ELIZABETH NEAR DUBLIN · IE

Inventors

• John B. Pethica · Felton, GB
• Graham Cross · Dublin, IE
• Hakan Ozgur Ozer · Konyaaltı, TR
• Barry S. O'Connell · Dublin, IE

Key dates

• Filing date: Oct 19, 2007
• Grant date: Dec 15, 2009
• Expiry date: Jan 7, 2028

Classification

• Technology area (CPC Y): Emerging Cross-Sectional Technologies
• CPC primary: Y10T428/24479
• WIPO field: Other special machines
• WIPO sector: Mechanical engineering

Abstract

Systems and methods for forming patterns and structures in target materials are described. The method produces a pattern or structure in a target material by contacting a stamp including one or more features with a target material using a normal load sufficient for keeping the one or more features in contact with the target material, and providing a cyclic shear force in an amount sufficient to extrude the target material and form a negative relief of the one more features in the target material. The systems and methods can be used to produce a variety of articles including, but not limited to, semiconductor integrated electrical circuits, integrated optical, magnetic, mechanical circuits and microdevices.