Spin-coating apparatus and coated substrates prepared using the same
US7632352B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 9, 2005 |
| Grant date | Dec 15, 2009 |
| Priority date | — |
| Expiry date | Oct 27, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/21
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
Provided is a spin coating apparatus having a ring-shaped or polygonal auxiliary member for use in manufacture of a coated substrate via spin coating, wherein the auxiliary member is positioned adjacent to the side of a substrate for coating, within a range of a spaced distance of 0.03 to 0.8 mm and a range of a height deviation of less than 0.1 mm, upon mounting the substrate.When a surface of a substrate for coating is spin coated with a coating agent using the apparatus of the present invention, it is possible to eliminate or effectively reduce a ski-jump phenomenon at end portions of a coated substrate occurring when spin coating is performed, thereby resulting in uniform coating of a coating solution on the substrate, and it is also possible to effectively decrease contamination of the substrate for coating due to inflow or stay of the remaining coating agent.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.