Vacuum sputtering cathode
US7632383B2 · kind B2 · utility
1Cited by
6References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jan 10, 2005 |
| Grant date | Dec 15, 2009 |
| Priority date | — |
| Expiry date | Jan 10, 2025 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J37/3497
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A vacuum sputtering cathode includes a target support having a cooler. The cathode includes a support base on which a frame is disposed. The frame defines at least one cavity for the circulation of a coolant. A membrane is disposed on top of the frame and the base, frame and membrane are assembled at the periphery of the target.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.