Patent · US Active

Sub-resolution assist features

US7632610B2 · kind B2 · utility

176Cited by

4References

20Claims

0Family size

Assignee

Intel Corporation · US

Inventors

Charles H. Wallace · Portland, US
Paul A. Nyhus · Portland, US
Swaminathan Sivakumar · Portland, US

Key dates

Filing date	Sep 2, 2004
Grant date	Dec 15, 2009
Priority date	—
Expiry date	Mar 20, 2027

Classification

Technology area (CPC G)Physics
CPC primaryG03F1/36
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Systems and techniques relating to the layout and use of sub-resolution assist features. In one implementation, a mask includes a first feature and a second feature separated from each other by a gap and a sub-resolution assist feature bridging the gap between the first feature and the second feature.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.