Mask
US7632621B2 · kind B2 · utility
3Cited by
27References
11Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 23, 2004 |
| Grant date | Dec 15, 2009 |
| Priority date | — |
| Expiry date | Nov 18, 2026 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC09D11/34
- WIPO fieldBasic materials chemistry
- WIPO sectorChemistry
Abstract
A mask is described for forming an image on a substrate. The mask may be selectively applied to a radiant energy sensitive material on the substrate. Actinic radiation applied to the composite chemically changes portions of the radiant energy sensitive material not covered by the mask. The mask and portions of the radiant energy sensitive material are removed using a suitable aqueous base developer. The mask is composed of aqueous base soluble or dispersible polymers and light-blocking agents.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.