Antireflective hardmask composition and methods for using same
US7632622B2 · kind B2 · utility
6Cited by
7References
15Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Dec 12, 2005 |
| Grant date | Dec 15, 2009 |
| Priority date | — |
| Expiry date | Nov 13, 2026 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10S430/115
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Hardmask compositions having antireflective properties useful in lithographic processes, methods of using the same, and semiconductor devices fabricated by such methods, are provided. Antireflective hardmask compositions of the invention include:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.