UV light exposure for functionalization and hydrophobization of pure-silica zeolites

US7632771B2 · kind B2 · utility

Assignees

• IMEC · BE
• Katholieke Universiteit Leuven · BE

Inventors

• Francesca Iacopi · Leuven, BE
• Salvador Eslava Fernandez · Leuven, BE
• Christine Kirschhock · Oud-Heverlee, BE
• Johan Martens · Overijse, BE

Key dates

• Filing date: Feb 6, 2007
• Grant date: Dec 15, 2009
• Expiry date: Jan 20, 2028

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/02282
• WIPO field: Chemical engineering
• WIPO sector: Chemistry

Abstract

A method is provided for making pure-silica-zeolite films useful as low-k material, specifically, more hydrophobic, homogeneous and with absence of cracks. The method utilizes a UV cure; preferably the UV cure is performed at temperatures at higher than the deposition temperature. The UV-assisted cure removes the organic template promoting organic functionalization and silanol condensation, making the silica-zeolite films more hydrophobic. Moreover, the zeolite material is also mechanically stronger and crack-free. The method can be used to prepare pure-silica-zeolite films more suitable as low-k materials in semiconductor processing.