Patent · US Active

Process for separating zirconium and hafnium

US7635396B2 · kind B2 · utility

1Cited by
2References
17Claims
0Family size

Assignee

Inventors

Key dates

Filing dateMay 2, 2007
Grant dateDec 22, 2009
Priority date
Expiry dateJan 31, 2028

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC07F7/003
  • WIPO fieldChemical engineering
  • WIPO sectorChemistry

Abstract

The present invention provides a new process for separating zirconium and hafnium compounds, in particular to remove traces of zirconium compounds from hafnium compounds, using fractional crystallisation, as well as hafnium compounds obtainable in accordance with this process.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.