Apparatus for dispensing photo-resist in semiconductor device fabrication equipment
US7635410B2 · kind B2 · utility
3Cited by
20References
18Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Jun 14, 2006 |
| Grant date | Dec 22, 2009 |
| Priority date | — |
| Expiry date | Dec 26, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/6715
- WIPO fieldChemical engineering
- WIPO sectorChemistry
Abstract
A photo-resist dispensing apparatus is disclosed and comprises; a tank adapted to hold a photo-resist solution, a pump unit adapted to pump the photo-resist solution from the tank, a filter unit adapted to receive the photo-resist solution from the pump unit, and at least one of a first gas discharge unit connected to the tank and adapted to remove gas bubbles from the photo-resist solution held in the tank, and a second gas discharge unit connected to the filter unit and adapted to remove gas bubbles from the photo-resist solution in the filter.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.