TFT LCD array substrate and manufacturing method thereof

US7635616B2 · kind B2 · utility

Assignee

• BOE OPTOELECTRONICS TECHNOLOGY CO., LTD. · CN

Inventors

• Chaoyong Deng · Beijing, CN
• Seung Moo Rim · Beijing, CN

Key dates

• Filing date: May 23, 2007
• Grant date: Dec 22, 2009
• Expiry date: Oct 19, 2027

Classification

• Technology area (CPC H): Electricity
• CPC primary: H10D86/60

Abstract

A TFT LCD array substrate and a manufacturing method thereof. The TFT LCD array substrate includes a substrate and a pixel array on the substrate. Each pixel has: a gate line and a gate electrode formed on the substrate; a gate insulating layer formed on the gate line and the gate electrode; a semiconductor layer formed on the gate insulating layer disposed on the gate electrode; an ohmic contact layer having two parts, which are disposed on two sides of the semiconductor layer respectively and are apart from one another; an isolation insulating dielectric layer covering the substrate and the gate insulating layer except a portion on which the semiconductor layer is formed; a pixel electrode formed on the isolation insulating dielectric layer and the ohmic contact layer over the semiconductor layer; a source/drain electrode formed on the pixel electrode over the ohmic contact layer, and a passivation layer at least covering the semiconductor layer. The TFT LCD array substrate can be manufactured with a 3Mask technology, thereby the process steps are reduced and the utilization ratio of the equipment is improved.