Method and instrument for chemical defect characterization in high vacuum
US7635842B2 · kind B2 · utility
4Cited by
4References
24Claims
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Key dates
| Filing date | Feb 15, 2008 |
| Grant date | Dec 22, 2009 |
| Priority date | — |
| Expiry date | Jun 13, 2028 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N23/2276
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A method and the instrument for characterization of the defects on a surface with Auger electron spectroscopy in a high vacuum environment are disclosed. Defects on the surface of a sample may be characterized with Auger electron spectroscopy in a high vacuum environment.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.