Photoresist coating failure sensing methods and detection devices
US7638096B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Jun 24, 2004 |
| Grant date | Dec 29, 2009 |
| Priority date | — |
| Expiry date | Feb 3, 2027 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/02118
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Methods and devices for detecting photoresist coating failures are disclosed. A disclosed method to detect a photoresist coating failure on a semiconductor wafer comprises: loading a photoresist coated wafer on a notch position check block; rotating the coated wafer; detecting the position of a notch in the wafer; blowing air toward the surface of the wafer with at least one air nozzle located over the rotating wafer; detecting an amount of the air blown from the at least one air nozzle; and generating a coating failure signal if a variation in the amount of air blown from the at least one air nozzle is indicative of a photoresist coating failure.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.